Some future perspectives in soft- and hard- X-ray photoemission

Journal of Electron Spectroscopy and Related Phenomena

Volumn 195, Issue , 2014, Pages 409-422

  Fadley, Charles S ^a,b   Nemšák, Slavomir ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Ambient pressure photoemission; Angle resolved photoemission; ARPES; Hard X ray photoelectron diffraction; Hard X ray photoemission; HARPES; HAXPES; HXPD; HXPS; PH; Photoelectron diffraction; Photoelectron holography; Photoemission; Spintronics; Standing wave photoemission; Synchrotron radiation; X ray photoemission; XPD; XPS

Indexed keywords

DIFFRACTION; ELASTIC WAVES; ELECTRONIC STRUCTURE; HOLOGRAPHY; MAGNETIC SEMICONDUCTORS; MAGNETOELECTRONICS; PH; PHOTOELECTRONS; PHOTONS; SYNCHROTRON RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

AMBIENT PRESSURES; ANGLE-RESOLVED PHOTOEMISSION; ARPES; HARD X RAY; HARD X-RAY PHOTOEMISSION; HARPES; HAX-PES; HXPD; HXPS; PHOTOELECTRON DIFFRACTION; PHOTOELECTRON HOLOGRAPHIES; STANDING WAVE; X-RAY PHOTOEMISSIONS; XPD;

PHOTOEMISSION;

EID: 85027936959     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2014.06.004     Document Type: Article

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