Making use of x-ray optical effects in photoelectron-, Auger electron-, and x-ray emission spectroscopies: Total reflection, standing-wave excitation, and resonant effects

Journal of Applied Physics

Volumn 113, Issue 7, 2013, Pages

  Yang, S H ^a   Gray, A X ^b,c,d   Kaiser, A M ^b,c,e   Mun, B S ^b,f   Sell, B C ^b,c,g,h   Kortright, J B ^b   Fadley, C S ^b,c  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^e FORSCHUNGSZENTRUM JÜLICH   (Germany)

^f Hanyang University   (South Korea)

^g OTTERBEIN UNIVERSITY   (United States)

^h WRIGHT PATTERSON AIR FORCE BASE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARBITRARY MULTILAYERS; AUGER ELECTRON; DENSITIES OF STATE; DEPTH PROFILE; FLAT SURFACES; GRAZING INCIDENCE; MAGNETIC CIRCULAR DICHROISMS; NANO-SCALE SYSTEM; OPEN ACCESS; OPTICAL EFFECTS; RESONANCE CONDITION; RESONANT EFFECT; STANDING WAVE; SURFACE AND INTERFACES; TOTAL REFLECTION; VARIABLE POLARIZATIONS; X RAY EMISSION SPECTROSCOPY; X RAY INTENSITY; X-RAY EMISSION INTENSITY;

AUGER ELECTRON SPECTROSCOPY; ELECTROMAGNETIC WAVE EMISSION; ELECTROMAGNETIC WAVE REFLECTION; EMISSION SPECTROSCOPY; PHOTOELECTRONS; PHOTONS; X RAY SCATTERING;

X RAYS;

EID: 84874633105     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4790171     Document Type: Article

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