Depth-resolved soft x-ray photoelectron emission microscopy in nanostructures via standing-wave excited photoemission

Applied Physics Letters

Volumn 93, Issue 24, 2008, Pages

  Kronast, F ^a   Ovsyannikov, R ^a   Kaiser, A ^b   Wiemann, C ^b   Yang, S H ^b   Burgler D E ^b   Schreiber, R ^c   Salmassi, F ^d   Fischer, P ^d   Durr, H A ^a   Schneider, C M ^b   Eberhardt, W ^a   Fadley, C S ^b,d,e  

^a HAHN MEITNER INSTITUT   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c IBM ALMADEN RESEARCH CENTER   (United States)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^e UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MIRRORS; PHOTOIONIZATION; PHOTONS; SILVER; STANDING WAVE METERS;

BRAGG ANGLES; DEPTH RESOLUTIONS; MULTILAYER MIRRORS; PHOTOELECTRON EMISSION MICROSCOPIES; SURFACE NORMALS; TRILAYER; WAVE EXCITATIONS; WAVE FIELDS;

MULTILAYERS;

EID: 57849088689     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3046782     Document Type: Article

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