메뉴 건너뛰기




Volumn 14, Issue 13, 2006, Pages 6001-6010

Overlay measurement using angular scatterometer for the capability of integrated metrology

Author keywords

[No Author keywords available]

Indexed keywords


EID: 85010150267     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.14.006001     Document Type: Article
Times cited : (14)

References (11)
  • 1
    • 2942648265 scopus 로고    scopus 로고
    • A New Approach to Pattern Metrology
    • C. P. Ausschnitt, “A New Approach to Pattern Metrology,” Proc. SPIE 5375, 51-65 (2004).
    • (2004) Proc. SPIE , vol.5375 , pp. 51-65
    • Ausschnitt, C.P.1
  • 2
    • 4344698031 scopus 로고    scopus 로고
    • Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology
    • K. Lensing, C. Miller, G. Chudleigh, B. Swain, M. Laughery, A. Viswanathan, “Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology,” Proc. SPIE 5375, 307-316 (2004).
    • (2004) Proc. SPIE , vol.5375 , pp. 307-316
    • Lensing, K.1    Miller, C.2    Chudleigh, G.3    Swain, B.4    Laughery, M.5    Viswanathan, A.6
  • 3
    • 0242441473 scopus 로고    scopus 로고
    • Advanced process control for polysilicon gate teching using integrated optical CD metrology
    • G P Kota, J. Luque, V. Vahedi, A. Khathuria, T. Dziura, A. Levy, “Advanced process control for polysilicon gate teching using integrated optical CD metrology,” Proc. SPIE 5044, 90-96 (2003).
    • (2003) Proc. SPIE , vol.5044 , pp. 90-96
    • Kota, G.P.1    Luque, J.2    Vahedi, V.3    Khathuria, A.4    Dziura, T.5    Levy, A.6
  • 4
    • 2942670512 scopus 로고    scopus 로고
    • In-tool process control for advanced patterning based on integrated metrology
    • D. S. L. Mui, H. Sasano, W. Liu, J. Yamartino, A. Skumanich, “In-tool process control for advanced patterning based on integrated metrology,” Proc. SPIE 5378, 10-17 (2004).
    • (2004) Proc. SPIE , vol.5378 , pp. 10-17
    • Mui, D.S.L.1    Sasano, H.2    Liu, W.3    Yamartino, J.4    Skumanich, A.5
  • 6
    • 0141723640 scopus 로고    scopus 로고
    • Applications of angular scatterometry for the measurement for multiply-periodic features
    • C. J. Raymond, M Littau, B Youn, C. J. Sohn, J. A. Kim, Y. S. Kang, “Applications of angular scatterometry for the measurement for multiply-periodic features,” Proc. SPIE 5038, 577-584 (2003).
    • (2003) Proc. SPIE , vol.5038 , pp. 577-584
    • Raymond, C.J.1    Littau, M.2    Youn, B.3    Sohn, C.J.4    Kim, J.A.5    Kang, Y.S.6
  • 7
    • 0019586874 scopus 로고
    • Rigorous coupled-wave analysis of planar-grating diffraction
    • M. G. Moharam, T. K. Gaylord, “Rigorous coupled-wave analysis of planar-grating diffraction,” J. Opt. Soc. Am., 71, 811-818 (1981).
    • (1981) J. Opt. Soc. Am. , vol.71 , pp. 811-818
    • Moharam, M.G.1    Gaylord, T.K.2
  • 8
    • 0029307028 scopus 로고
    • Formualtion for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings
    • M. G. Moharam, E. B. Grann, D. A. Pomment, “Formualtion for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings,” J. Opt. Soc. Am. A, 12, 1068-1076 (1995).
    • (1995) J. Opt. Soc. Am. A , vol.12 , pp. 1068-1076
    • Moharam, M.G.1    Grann, E.B.2    Pomment, D.A.3
  • 9
    • 0028406228 scopus 로고
    • Algorithm for the rigorous coupled-wave analysis of grating diffraction
    • N. Chateau, J. P. Hugonin, “Algorithm for the rigorous coupled-wave analysis of grating diffraction,” J. Opt. Soc. Am. A, 11, 1321-1331 (1994).
    • (1994) J. Opt. Soc. Am. A , vol.11 , pp. 1321-1331
    • Chateau, N.1    Hugonin, J.P.2
  • 10
    • 0141500274 scopus 로고    scopus 로고
    • A. Hunter,” A novel diffraction based spectroscopic method for overlay metrology,” Proc
    • W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter,” A novel diffraction based spectroscopic method for overlay metrology,” Proc. SPIE 5038, 200-207 (2003).
    • (2003) SPIE , vol.5038 , pp. 200-207
    • Yang, W.1    Webb, R.L.2    Rabello, S.3    Hu, J.4    Lin, J.Y.5    Heaton, J.6    Dusa, M.7    Boef, A.8    Schaar, M.9


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.