In-tool process control for advanced patterning based on integrated metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5378, Issue , 2004, Pages 10-17

  Mui, David S L ^a   Sasano, Hiroki ^a   Liu, Wei ^a   Yamartino, John ^a   Skumanich, Andy ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

Advanced equipment control; Advanced process control; Closed loop control; Integrated metrology; Real time

Indexed keywords

ADVANCED EQUIPMENT CONTROL (AEC); ADVANCED PROCESS CONTROL; INTEGRATED METROLOGY; REAL-TIME FEEDBACK;

CLOSED LOOP CONTROL SYSTEMS; CONTROL EQUIPMENT; CORRELATION METHODS; DYNAMIC RANDOM ACCESS STORAGE; FEEDBACK CONTROL; INTEGRATED CIRCUITS; RELIABILITY; STATIC RANDOM ACCESS STORAGE;

PROCESS CONTROL;

EID: 2942670512     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537444     Document Type: Conference Paper

References (7)

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