Temperature optimization for MOCVD-based growth of ZnO thin films

2014 11th Annual High Capacity Optical Networks and Emerging/Enabling Technologies (Photonics for Energy), HONET-PfE 2014

Volumn , Issue , 2014, Pages 238-242

  Mishra, Prakash ^a   Monroe, Brianna ^a   Hussain, Babar ^a   Ferguson, Ian ^a  

^a University of North Carolina at Charlotte   (United States)

Author keywords

MOCVD; photoluminescence; spectral reflectance; temperature; thin film; transmission; zinc oxide

Indexed keywords

DEFECTS; DEPOSITION; FILM THICKNESS; KINETIC ENERGY; KINETICS; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL FILMS; OXIDE FILMS; PHOTOLUMINESCENCE; REFLECTION; SUPERCONDUCTING FILMS; TEMPERATURE; THIN FILMS; TRANSMISSIONS; VAPOR DEPOSITION; ZINC; ZINC OXIDE;

CRYSTAL QUALITIES; EXCITON EMISSION; SPECTRAL REFLECTANCES; TEMPERATURE GROWTH; TEMPERATURE OPTIMIZATION; THERMAL INDUCTION; TRANSMITTANCE MEASUREMENTS; ZINC OXIDE THIN FILMS;

FILM GROWTH;

EID: 84988254003     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/HONET.2014.7029400     Document Type: Conference Paper

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