Effect of post-thermal annealing on properties of ZnO thin film grown on c-Al2O3 by metal-organic chemical vapor deposition

Journal of Crystal Growth

Volumn 252, Issue 1-3, 2003, Pages 275-278

  Yang, Xiaotian ^a   Du, Guotong ^a   Wang, Xinqiang ^a   Wang, Jinzhong ^a   Liu, Boyang ^a   Zhang, Yuantao ^a   Liu, Dan ^a   Liu, Dali ^a   Ong, H C ^b   Yang, Shuren ^a  

^a JILIN UNIVERSITY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

A3. Metalorganic chemical vapor deposition; B1. Oxides; B2. Semiconducting II VI materials

Indexed keywords

ALUMINA; ANNEALING; CRYSTAL GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

POST-THERMAL ANNEALING;

THIN FILMS;

EID: 0037401387     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(03)00898-4     Document Type: Article

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