High-Resolution Distance Dependence Study of Surface-Enhanced Raman Scattering Enabled by Atomic Layer Deposition

Nano Letters

Volumn 16, Issue 7, 2016, Pages 4251-4259

  Masango, Sicelo S ^a   Hackler, Ryan A ^a   Large, Nicolas ^a   Henry, Anne Isabelle ^a   McAnally, Michael O ^a   Schatz, George C ^a   Stair, Peter C ^a   Van Duyne, Richard P ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

Author keywords

atomic layer deposition; distance dependence; operando; Surface enhanced Raman scattering

Indexed keywords

ALUMINUM; ATOMIC LAYER DEPOSITION; ATOMS; CATALYSIS; DEPOSITION; MONOLAYERS; RAMAN SCATTERING; SELF ASSEMBLED MONOLAYERS; SILVER; SUBSTRATES; SURFACE CHEMISTRY;

CATALYTIC REACTIONS; DISTANCE DEPENDENCE; HIGH RESOLUTION; NANOMETER-SCALE DISTANCES; OPERANDO; SURFACE ENHANCED RAMAN SCATTERING (SERS); SURFACE SPECIES; TRIMETHYLALUMINUM;

SURFACE SCATTERING;

EID: 84978689291     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/acs.nanolett.6b01276     Document Type: Article

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