Measurement of the distribution of site enhancements in surface-enhanced raman scattering

Science

Volumn 321, Issue 5887, 2008, Pages 388-392

  Fang, Ying ^a   Seong, Nak Hyun ^a   Dlott, Dana D ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

THIOPHENOL;

MEASUREMENT METHOD; RAMAN SPECTROSCOPY; SCATTERING; SPATIAL DISTRIBUTION;

ARTICLE; ELECTRIC FIELD; ELECTROMAGNETIC FIELD; LASER; MOLECULE; PRIORITY JOURNAL; RAMAN SPECTROMETRY;

EID: 47749137757     PISSN: 00368075     EISSN: 10959203     Source Type: Journal    
DOI: 10.1126/science.1159499     Document Type: Article

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32. This material is based on work supported by NSF under award DMR 0504038, the Air Force Office of Scientific Research under award FA9550-06-1-0235, and the Army Research Office under award W911NF-05-1-0345. Electron microscopy was carried out in the Center for Microanalysis of Materials, University of Illinois, which is supported by the U.S. Department of Energy under grant DEFG02-91ER45439.