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Volumn 28, Issue 8, 2016, Pages 1591-1596

3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene

(8) Kim, Ju Young a Lim, Joonwon a Jin, Hyeong Min a Kim, Bong Hoon a Jeong, Seong Jun a Choi, Dong Sung a Li, Dong Jun a Kim, Sang Ouk a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

3D; block copolymers; grapheme; instability; self assembly

Indexed keywords

GRAPHENE; PLASMA STABILITY; SELF ASSEMBLY;

3D TRANSFORMATIONS; BLOCK COPOLYMER LITHOGRAPHY; BLOCK COPOLYMER SELF-ASSEMBLY; CHEMICALLY-MODIFIED GRAPHENE; GRAPHEME; HIGHLY DENSE; MECHANICAL INSTABILITIES; NANOPATTERNING;

BLOCK COPOLYMERS;

EID: 84958923595 PISSN: 09359648 EISSN: 15214095 Source Type: Journal
DOI: 10.1002/adma.201504590 Document Type: Article

Times cited : (60)

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