Improvement of work function and hole injection efficiency of graphene anode using CHF3 plasma treatment

2D Materials

Volumn 2, Issue 1, 2015, Pages

  Cho, Himchan ^a   Kim, Seong Dae ^b   Han, Tae Hee ^a   Song, Intek ^a,c   Byun, Jin Woo ^a   Kim, Young Hoon ^a   Kwon, Sungjoo ^a   Bae, Sang Hoon ^b   Choi, Hee Cheul ^a,c   Ahn, Jong Hyun ^b   Lee, Tae Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Yonsei University   (South Korea)

^c Institute for Basic Science   (South Korea)

Author keywords

Dark injection space charge limited current transient measurement; Fluorination; Graphene; Hole injection efficiency; Hole only device; Work function

Indexed keywords

ANODES; BOND STRENGTH (CHEMICAL); CHARGE INJECTION; CHEMICAL VAPOR DEPOSITION; EFFICIENCY; ELECTRON INJECTION; FLUORINATION; FLUORINE; GRAPHENE DEVICES; HALOGENATION; PHOTOELECTRONS; PHOTONS; PLASMA APPLICATIONS; POWER QUALITY; TRANSIENT ANALYSIS; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; WORK FUNCTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CURRENT TRANSIENTS; DARK-INJECTION SPACE-CHARGE-LIMITED CURRENTS; GRAPHENE SHEETS; HOLE INJECTION; HOLE-ONLY DEVICE; ORGANIC OPTOELECTRONICS; PLASMA EXPOSURE TIME; PLASMA TREATMENT;

GRAPHENE;

EID: 84947239953     PISSN: None     EISSN: 20531583     Source Type: Journal    
DOI: 10.1088/2053-1583/2/1/014002     Document Type: Article

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