Photoelectron spectroscopy studies of plasma-fluorinated epitaxial graphene

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 30, Issue 3, 2012, Pages

  Sherpa, Sonam D ^a   Paniagua, Sergio A ^b   Levitin, Galit ^a   Marder, Seth R ^b   Williams, M D ^c   Hess, Dennis W ^a  

^a Georgia Institute of Technology   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^c CLARK ATLANTA UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC PROPERTIES; FLUORINATION; FLUORINE; HALOGENATION; PHOTOELECTRONS; PLASMAS; RAMAN SPECTROSCOPY; SULFUR HEXAFLUORIDE; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; XENON;

CARBON ATOMS; EMISSION CHARACTERISTICS; EPITAXIAL GRAPHENE; PLASMA TREATMENT; VALENCE BAND STATE; XENON DIFLUORIDE;

GRAPHENE;

EID: 84861685372     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3688760     Document Type: Article

References (42)

1. S. Gilje, S. Han, M. Wang, K. L. Wang, and R. B. Kaner, Nano Lett. 7, 3394 (2007). 10.1021/nl0717715
2. X. Wu, M. Sprinkle, X. Li, F. Ming, C. Berger, and W. A. de Heer, Phys. Rev. Lett. 101, 026801 (2008). 10.1103/PhysRevLett.101.026801
3. Z. Luo, Appl. Phys. Lett. 94, 111909 (2009). 10.1063/1.3098358
4. D. C. Elias, R. R. Nair, T. M. G. Mohiuddin, S. V. Morozov, P. Blake, M. P. Halsall, A. C. Ferrari, D. W. Boukhvalov, M. I. Katsnelson, A. K. Geim, and K. S. Novoselov, Science 323, 610 (2009). 10.1126/science.1167130
5. S. H. Cheng, K. Zou, F. Okino, H. R. Gutierrez, A. Gupta, N. Shen, P. C. Eklund, J. O. Sofo, and J. Zhu, Phys. Rev. B 81, 205435 (2010). 10.1103/PhysRevB.81.205435
6. K.-J. Jeon, ACS Nano 5, 1042 (2011). 10.1021/nn1025274
7. L. J. Cote, R. Cruz-Silva, and J. Huang, J. Am. Chem. Soc. 131, 11027 (2009). 10.1021/ja902348k
8. J. R. Lomeda, C. D. Doyle, D. V. Kosynkin, W.-F. Hwang, and J. M. Tour, J. Am. Chem. Soc. 130, 16201 (2008). 10.1021/ja806499w
9. Y. Si and E. T. Samulski, Nano Lett. 8, 1679 (2008). 10.1021/nl080604h
10. S. Stankovich, D. A. Dikin, G. H. B. Dommett, K. M. Kohlhaas, E. J. Zimney, E. A. Stach, R. D. Piner, S. T. Nguyen, and R. S. Ruoff, Nature 442, 282 (2006). 10.1038/nature04969
11. S. Stankovich, D. A. Dikin, R. D. Piner, K. A. Kohlhaas, A. Kleinhammes, Y. Jia, Y. Wu, S. T. Nguyen, and R. S. Ruoff, Carbon 45, 1558 (2007). 10.1016/j.carbon.2007.02.034
12. V. C. Tung, M. J. Allen, Y. Yang, and R. B. Kaner, Nat. Nanotechnol. 4, 25 (2009). 10.1038/nnano.2008.329
13. G. Wang, J. Yang, J. Park, X. Gou, B. Wang, H. Liu, and J. Yao, J. Phys. Chem. C 112, 8192 (2008). 10.1021/jp710931h
14. G. Williams, B. Seger, and P. V. Kamat, ACS Nano 2, 1487 (2008). 10.1021/nn800251f
15. Y. Zhu, M. D. Stoller, W. Cai, A. Velamakanni, R. D. Piner, D. Chen, and R. S. Ruoff, ACS Nano 4, 1227 (2010). 10.1021/nn901689k
16. R. R. Nair, Small 6, 2877 (2010). 10.1002/smll.v6.24
17. K. A. Worsley, P. Ramesh, S. K. Mandal, S. Niyogi, M. E. Itkis, and R. C. Haddon, Chem. Phys. Lett. 445, 51 (2007). 10.1016/j.cplett.2007.07.059
18. R. Hatada and K. Baba, Nucl. Instrum. Methods Phys. Res. B 148, 655 (1999). 10.1016/S0168-583X(98)00745-9
19. L.-Y. Meng and S.-J. Park, J. Colloid Interface Sci. 342, 559 (2010). 10.1016/j.jcis.2009.10.022
20. O. Ruff, O. Bretschneider, and F. Ebert, Z. Anorg. Allg. Chem. 217, 1 (1934). 10.1002/zaac.19342170102
21. R. Taylor, J. H. Holloway, E. G. Hope, A. G. Avent, G. J. Langley, T. J. Dennis, J. P. Hare, H. W. Kroto, and D. R. M. Walton, J. Chem. Soc., Chem. Commun. 9, 665 (1992). 10.1039/c39920000665
22. E. T. Mickelson, C. B. Huffman, A. G. Rinzler, R. E. Smalley, R. H. Hauge, and J. L. Margrave, Chem. Phys. Lett. 296, 188 (1998). 10.1016/S0009-2614(98)01026-4
23. P. E. Pehrsson, W. Zhao, J. W. Baldwin, C. Song, J. Liu, S. Kooi, and B. Zheng, J. Phys. Chem. B 107, 5690 (2003). 10.1021/jp027233s
24. H. F. Bettinger, ChemPhysChem 4, 1283 (2003). 10.1002/cphc.v4:12
25. F. Withers, M. Dubois, and A. K. Savchenko, Phys. Rev. B 82, 073403 (2010). 10.1103/PhysRevB.82.073403
26. J. T. Robinson, Nano Lett. 10, 3001 (2010). 10.1021/nl101437p
27. M. Baraket, S. G. Walton, E. H. Lock, J. T. Robinson, and F. K. Perkins, Appl. Phys. Lett. 96, 231501 (2010). 10.1063/1.3436556
28. H. Yang, M. Chen, H. Zhou, C. Qiu, L. Hu, F. Yu, W. Chu, S. Sun, and L. Sun, J. Phys. Chem. C 115, 16844 (2011). 10.1021/jp204573z
29. W. A. de Heer, C. Berger, M. Ruan, M. Sprinkle, X. Li, Y. Hu, B. Zhang, J. Hankinson, and E. Conrad, Proc. Natl. Acad. Sci. 108, 16900 (2011). 10.1073/pnas.1105113108
30. J. Hass, W. A. de Heer, and E. H. Conrad, J. Phys.: Condens. Matter 20, (2008). 10.1088/0953-8984/20/32/323202
31. C. Berger, J. Phys. Chem. B 108, 19912 (2004). 10.1021/jp040650f
32. J. Hass, Phys. Rev. Lett. 100, 125504 (2008). 10.1103/PhysRevLett.100. 125504
33. S. Unarunotai, ACS Nano 4, 5591 (2010). 10.1021/nn101896a
34. S. Hoste, D. F. Van De Vondel, and G. P. Van Der Kelen, J. Electron. Spectrosc. Relat. Phenom. 17, 191 (1979). 10.1016/0368-2048(79)85040-9
35. D. T. Clark, D. Kilcast, D. B. Adams, and W. K. R. Musgrave, J. Electron. Spectrosc. Relat. Phenom. 1, 227 (1972). 10.1016/0368-2048(72)85013-8
36. E. Rollings, J. Phys. Chem. Solids 67, 2172 (2006). 10.1016/j.jpcs.2006. 05.010
37. F. Tuinstra, J. Chem. Phys. 53, 1126 (1970). 10.1063/1.1674108
38. C. Bittencourt, G. Van Lier, X. Ke, I. Suarez-Martinez, A. Felten, J. Ghijsen, G. Van Tendeloo, and C. P. Ewels, ChemPhysChem 10, 920 (2009). 10.1002/cphc.v10:6
39. T. C. Leung, C. L. Kao, W. S. Su, Y. J. Feng, and C. T. Chan, Phys. Rev. B 68, 195408 (2003). 10.1103/PhysRevB.68.195408
40. R. P. W. Lawson and G. Carter, Vacuum 18, 205 (1968). 10.1016/0042-207X(68)91186-X
41. J. J. A. Dillon and H. E. Farnsworth, J. Appl. Phys. 29, 1195 (1958). 10.1063/1.1723401
42. M. Chelvayohan, J. Phys. C: Solid State Phys. 16, L323 (1983). 10.1088/0022-3719/16/11/004