Chemical vapor deposition growth of large-scale hexagonal boron nitride with controllable orientation

Nano Research

Volumn 8, Issue 10, 2015, Pages 3164-3176

  Song, Xiuju ^a   Gao, Junfeng ^c   Nie, Yufeng ^a   Gao, Teng ^a   Sun, Jingyu ^a   Ma, Donglin ^a   Li, Qiucheng ^a   Chen, Yubin ^a   Jin, Chuanhong ^d   Bachmatiuk, Alicja ^e   Rümmeli, Mark H ^f,g   Ding, Feng ^c   Zhang, Yanfeng ^a,b   Liu, Zhongfan ^a  

^a PEKING UNIVERSITY   (China)

^b PEKING UNIVERSITY   (China)

^c HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^d ZHEJIANG UNIVERSITY   (China)

^e CENTRE OF POLYMER AND CARBON MATERIALS   (Poland)

^f Sungkyunkwan University   (South Korea)

^g Institute for Basic Science   (South Korea)

Author keywords

chemical vapor deposition (CVD); Cu foil; domain size; hexagonal boron nitride; orientation

Indexed keywords

EID: 84943361339     PISSN: 19980124     EISSN: 19980000     Source Type: Journal    
DOI: 10.1007/s12274-015-0816-9     Document Type: Article

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