Residual stress relaxation and stiffness in spin-coated polymer films: Characterization by ellipsometry and fluorescence

Polymer

Volumn 76, Issue , 2015, Pages 113-122

  Askar, Shadid ^a   Evans, Christopher M ^a   Torkelson, John M ^a  

^a Northwestern University   (United States)

Author keywords

Stiffness; Stress relaxation; Thin films

Indexed keywords

ACTIVATION ENERGY; ELLIPSOMETRY; FLUORESCENCE; GLASS; GLASS TRANSITION; INTERFACES (MATERIALS); PYRENE; RESIDUAL STRESSES; SILICONES; STIFFNESS; STRESS RELAXATION; SUBSTRATES; TEMPERATURE DISTRIBUTION; THIN FILMS;

ARRHENIUS TEMPERATURE; EMISSION SPECTRAL; FREESTANDING FILMS; GLASS SUBSTRATES; MEASUREMENTS OF; NANOSECOND TIME SCALE; POLYSTYRENE FILMS; SPIN COATED POLYMERS;

POLYMER FILMS;

EID: 84941272956     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2015.08.036     Document Type: Article

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