-
5
-
-
9444294610
-
-
D. N. Theodorou, in (1), chap. 7
-
D. N. Theodorou, in (1), chap. 7.
-
-
-
-
9
-
-
0019071528
-
-
W. M. Prest Jr. and D. J. Luca, J. Appl. Phys. 50, 6067 (1979); ibid. 51, 5170 (1980).
-
(1980)
J. Appl. Phys.
, vol.51
, pp. 5170
-
-
-
15
-
-
9444250696
-
-
note
-
14C-labeled acetyl chloride. Radioactivity measurements of residual, labeled PGMEA were made with a Packard Tri-Carb 460 liquid scintillation system.
-
-
-
-
16
-
-
9444235307
-
-
note
-
2O before the water rinse. Transmission FTIR (with an IBM IR 98) was done on KBr disks and silicon wafers, and reflection FTIR was done on glass slides having a 200 Å Cr adhesion layer overcoated with 2000 Å gold. Some quartz surfaces were treated with octa-decyltrichlorosilane or hexamethyldisilazane to make them hydrophobic before PD6S deposition. Films were deposited by spin-casting from isooctane solutions ranging from 0.1 to 2 weight % concentration at 3000 rpm for 40 s. Film thickness was determined with a Rudolph Research auto EL-II ellipsometer.
-
-
-
-
17
-
-
0000432096
-
-
L. Schlegel, T. Ueno, N. Hayashi, T. Iwayanagi, J. Vac. Sci. Tech. B9, 278 (1991).
-
(1991)
J. Vac. Sci. Tech.
, vol.B9
, pp. 278
-
-
Schlegel, L.1
Ueno, T.2
Hayashi, N.3
Iwayanagi, T.4
-
20
-
-
9444296737
-
-
thesis, Stanford University
-
V. Rao, thesis, Stanford University (1994).
-
(1994)
-
-
Rao, V.1
-
21
-
-
0345669819
-
-
T. K. Kwei, J. Polym. Sci. Polym. Lett. Ed. 22, 307 (1984); T. Suzuki, E. M. Pearce, T. K. Kwei, Polymer 33, 198 (1992); F. Wang, E. M. Pearce, T. K. Kwei, J. Polym. Sci. Polym. Phys. 29, 619 (1991).
-
(1984)
J. Polym. Sci. Polym. Lett. Ed.
, vol.22
, pp. 307
-
-
Kwei, T.K.1
-
22
-
-
0026765797
-
-
T. K. Kwei, J. Polym. Sci. Polym. Lett. Ed. 22, 307 (1984); T. Suzuki, E. M. Pearce, T. K. Kwei, Polymer 33, 198 (1992); F. Wang, E. M. Pearce, T. K. Kwei, J. Polym. Sci. Polym. Phys. 29, 619 (1991).
-
(1992)
Polymer
, vol.33
, pp. 198
-
-
Suzuki, T.1
Pearce, E.M.2
Kwei, T.K.3
-
23
-
-
0026137774
-
-
T. K. Kwei, J. Polym. Sci. Polym. Lett. Ed. 22, 307 (1984); T. Suzuki, E. M. Pearce, T. K. Kwei, Polymer 33, 198 (1992); F. Wang, E. M. Pearce, T. K. Kwei, J. Polym. Sci. Polym. Phys. 29, 619 (1991).
-
(1991)
J. Polym. Sci. Polym. Phys.
, vol.29
, pp. 619
-
-
Wang, F.1
Pearce, E.M.2
Kwei, T.K.3
-
24
-
-
0026222973
-
-
P. C. Painter, S. L. Shenoy, D. E. Bhagwagar, J. Fishburn, M. M. Coleman, Macromolecules 24, 5623 (1991).
-
(1991)
Macromolecules
, vol.24
, pp. 5623
-
-
Painter, P.C.1
Shenoy, S.L.2
Bhagwagar, D.E.3
Fishburn, J.4
Coleman, M.M.5
-
25
-
-
84963224113
-
-
M. M. Coleman and P. C. Painter, Appl. Spect. Rev. 20, 255 (1984); E. J. Moskala, D. F. Varnell, M. M. Coleman, Polymer 26, 228 (1985); A. M. Lichkus, P. C. Painter, M. M. Coleman, Macromolecules 21, 2636 (1988).
-
(1984)
Appl. Spect. Rev.
, vol.20
, pp. 255
-
-
Coleman, M.M.1
Painter, P.C.2
-
26
-
-
0022013723
-
-
M. M. Coleman and P. C. Painter, Appl. Spect. Rev. 20, 255 (1984); E. J. Moskala, D. F. Varnell, M. M. Coleman, Polymer 26, 228 (1985); A. M. Lichkus, P. C. Painter, M. M. Coleman, Macromolecules 21, 2636 (1988).
-
(1985)
Polymer
, vol.26
, pp. 228
-
-
Moskala, E.J.1
Varnell, D.F.2
Coleman, M.M.3
-
27
-
-
0024054819
-
-
M. M. Coleman and P. C. Painter, Appl. Spect. Rev. 20, 255 (1984); E. J. Moskala, D. F. Varnell, M. M. Coleman, Polymer 26, 228 (1985); A. M. Lichkus, P. C. Painter, M. M. Coleman, Macromolecules 21, 2636 (1988).
-
(1988)
Macromolecules
, vol.21
, pp. 2636
-
-
Lichkus, A.M.1
Painter, P.C.2
Coleman, M.M.3
-
28
-
-
0024733839
-
-
R. D. Miller and J. Michl, Chem. Rev. 89, 1359 (1989); R. D. Miller, D. Hofer, J. F. Rabolt, G. N. Fickes, J. Am. Chem. Soc. 107, 2172 (1985); H. Kuzmany, J. F. Rabolt, B. L. Farmer, R. D. Miller, J. Chem. Phys. 85, 7413 (1986).
-
(1989)
Chem. Rev.
, vol.89
, pp. 1359
-
-
Miller, R.D.1
Michl, J.2
-
29
-
-
33845378484
-
-
R. D. Miller and J. Michl, Chem. Rev. 89, 1359 (1989); R. D. Miller, D. Hofer, J. F. Rabolt, G. N. Fickes, J. Am. Chem. Soc. 107, 2172 (1985); H. Kuzmany, J. F. Rabolt, B. L. Farmer, R. D. Miller, J. Chem. Phys. 85, 7413 (1986).
-
(1985)
J. Am. Chem. Soc.
, vol.107
, pp. 2172
-
-
Miller, R.D.1
Hofer, D.2
Rabolt, J.F.3
Fickes, G.N.4
-
30
-
-
0001492044
-
-
R. D. Miller and J. Michl, Chem. Rev. 89, 1359 (1989); R. D. Miller, D. Hofer, J. F. Rabolt, G. N. Fickes, J. Am. Chem. Soc. 107, 2172 (1985); H. Kuzmany, J. F. Rabolt, B. L. Farmer, R. D. Miller, J. Chem. Phys. 85, 7413 (1986).
-
(1986)
J. Chem. Phys.
, vol.85
, pp. 7413
-
-
Kuzmany, H.1
Rabolt, J.F.2
Farmer, B.L.3
Miller, R.D.4
-
34
-
-
9444252506
-
-
J. M. Zeigler, Ed. ACS Symposium Series 224, American Chemical Society, Washington, DC, chap. 21
-
F. C. Schilling, F. A. Bovey, A. J. Lovinger, J. M. Zeigler, in Silicon-Based Polymer Science, J. M. Zeigler, Ed. (ACS Symposium Series 224, American Chemical Society, Washington, DC, 1990), chap. 21.
-
(1990)
Silicon-Based Polymer Science
-
-
Schilling, F.C.1
Bovey, F.A.2
Lovinger, A.J.3
Zeigler, J.M.4
-
36
-
-
0342869049
-
-
M. Avrami, J. Chem. Phys. 7, 1103 (1939); ibid. 8, 212 (1940); ibid. 9, 177 (1941); U. R. Evans, Trans. Faraday Soc. 41, 365 (1945).
-
(1939)
J. Chem. Phys.
, vol.7
, pp. 1103
-
-
Avrami, M.1
-
37
-
-
0001336124
-
-
M. Avrami, J. Chem. Phys. 7, 1103 (1939); ibid. 8, 212 (1940); ibid. 9, 177 (1941); U. R. Evans, Trans. Faraday Soc. 41, 365 (1945).
-
(1940)
J. Chem. Phys.
, vol.8
, pp. 212
-
-
-
38
-
-
0346395110
-
-
M. Avrami, J. Chem. Phys. 7, 1103 (1939); ibid. 8, 212 (1940); ibid. 9, 177 (1941); U. R. Evans, Trans. Faraday Soc. 41, 365 (1945).
-
(1941)
J. Chem. Phys.
, vol.9
, pp. 177
-
-
-
39
-
-
0345285663
-
-
M. Avrami, J. Chem. Phys. 7, 1103 (1939); ibid. 8, 212 (1940); ibid. 9, 177 (1941); U. R. Evans, Trans. Faraday Soc. 41, 365 (1945).
-
(1945)
Trans. Faraday Soc.
, vol.41
, pp. 365
-
-
Evans, U.R.1
-
41
-
-
0021427705
-
-
J. M. Escleine, B. Monasse, E. Wey, J. M. Haudin, Colloid Polym. Sci. 262, 366 (1984); N. Billon, J. M. Escleine, J. M. Haudin, ibid. 267, 668 (1989); N. Billon and J. M. Haudin, ibid., p. 1064; N. Billon and J. M. Haudin, Ann. Chim. Fr. 15, 249 (1990); N. Billon, C. Magnet, J. M. Haudin, D. Lefebvre, Colloid Polym. Sci. 272, 633 (1994).
-
(1984)
Colloid Polym. Sci.
, vol.262
, pp. 366
-
-
Escleine, J.M.1
Monasse, B.2
Wey, E.3
Haudin, J.M.4
-
42
-
-
0024716609
-
-
J. M. Escleine, B. Monasse, E. Wey, J. M. Haudin, Colloid Polym. Sci. 262, 366 (1984); N. Billon, J. M. Escleine, J. M. Haudin, ibid. 267, 668 (1989); N. Billon and J. M. Haudin, ibid., p. 1064; N. Billon and J. M. Haudin, Ann. Chim. Fr. 15, 249 (1990); N. Billon, C. Magnet, J. M. Haudin, D. Lefebvre, Colloid Polym. Sci. 272, 633 (1994).
-
(1989)
Colloid Polym. Sci.
, vol.267
, pp. 668
-
-
Billon, N.1
Escleine, J.M.2
Haudin, J.M.3
-
43
-
-
0021427705
-
-
J. M. Escleine, B. Monasse, E. Wey, J. M. Haudin, Colloid Polym. Sci. 262, 366 (1984); N. Billon, J. M. Escleine, J. M. Haudin, ibid. 267, 668 (1989); N. Billon and J. M. Haudin, ibid., p. 1064; N. Billon and J. M. Haudin, Ann. Chim. Fr. 15, 249 (1990); N. Billon, C. Magnet, J. M. Haudin, D. Lefebvre, Colloid Polym. Sci. 272, 633 (1994).
-
Colloid Polym. Sci.
, pp. 1064
-
-
Billon, N.1
Haudin, J.M.2
-
44
-
-
0021427705
-
-
J. M. Escleine, B. Monasse, E. Wey, J. M. Haudin, Colloid Polym. Sci. 262, 366 (1984); N. Billon, J. M. Escleine, J. M. Haudin, ibid. 267, 668 (1989); N. Billon and J. M. Haudin, ibid., p. 1064; N. Billon and J. M. Haudin, Ann. Chim. Fr. 15, 249 (1990); N. Billon, C. Magnet, J. M. Haudin, D. Lefebvre, Colloid Polym. Sci. 272, 633 (1994).
-
(1990)
Ann. Chim. Fr.
, vol.15
, pp. 249
-
-
Billon, N.1
Haudin, J.M.2
-
45
-
-
0028445535
-
-
J. M. Escleine, B. Monasse, E. Wey, J. M. Haudin, Colloid Polym. Sci. 262, 366 (1984); N. Billon, J. M. Escleine, J. M. Haudin, ibid. 267, 668 (1989); N. Billon and J. M. Haudin, ibid., p. 1064; N. Billon and J. M. Haudin, Ann. Chim. Fr. 15, 249 (1990); N. Billon, C. Magnet, J. M. Haudin, D. Lefebvre, Colloid Polym. Sci. 272, 633 (1994).
-
(1994)
Colloid Polym. Sci.
, vol.272
, pp. 633
-
-
Billon, N.1
Magnet, C.2
Haudin, J.M.3
Lefebvre, D.4
-
47
-
-
9444261550
-
-
note
-
Supported in part by the Polymers Program of ONR. the Sematech Center of Excellence on Lithography and Pattern Transfer, and the NSF-MRSEC Center on Polymer Interfaces and Macromolecular Assemblies (CPIMA).
-
-
-
|