Solvent retention in thin spin-coated polystyrene and poly(methyl methacrylate) homopolymer films studied by neutron reflectometry

Macromolecules

Volumn 43, Issue 2, 2010, Pages 1117-1123

  Zhang, Xiaohua ^a   Yager, Kevin G ^a   Kang, Shuhui ^a   Fredin, Nathaniel J ^a   Akgun, Bulent ^b,c   Satija, Sushil ^b   Douglas, Jack F ^a   Karim, Alamgir ^a,d   Jones, Ronald L ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c UNIVERSITY OF MARYLAND   (United States)

^d The University of Akron   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HOMOPOLYMERS; NEUTRON REFLECTOMETRY; PMMA FILMS; POLYMER THIN FILMS; RESIDUAL SOLVENT CONTENT; RESIDUAL SOLVENTS; SILICON SUBSTRATES; THERMAL TREATMENT; TOLUENE SOLUTION;

DEUTERIUM; ESTERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS TRANSITION; HEAT TREATMENT; NEUTRON DIFFRACTION; NEUTRON REFLECTION; PHOTORESISTS; POLYMERIC FILMS; POLYSTYRENES; REFLECTION; REFLECTOMETERS; SOLVENTS; SPIN DYNAMICS; TOLUENE;

POLYMER FILMS;

EID: 74849140160     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma902168w     Document Type: Article

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