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Volumn 159, Issue , 2015, Pages 455-458

Low temperature grown highly texture aluminum alloyed iron silicide on silicon substrate for opto-electronic applications

Author keywords

Al alloyed iron silicide (FeSi2< inf>(Al)); Alpha phase iron silicide; Highly texture FeSi2< inf>(Al); Low thermal budget

Indexed keywords

ALUMINUM ALLOYS; AMORPHOUS MATERIALS; ANNEALING; BUDGET CONTROL; DEPOSITION; FIELD EFFECT TRANSISTORS; INTERFACES (MATERIALS); IRON; RAPID THERMAL ANNEALING; SILICIDES; SILICON; SILICON ALLOYS; TEMPERATURE; TERNARY ALLOYS; THIN FILMS;

EID: 84937555443     PISSN: 0167577X     EISSN: 18734979     Source Type: Journal    
DOI: 10.1016/j.matlet.2015.07.066     Document Type: Article
Times cited : (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.