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Volumn 7, Issue 20, 2015, Pages 9311-9319

Wafer-scale synthesis of thickness-controllable MoS2 films via solution-processing using a dimethylformamide/n-butylamine/2-aminoethanol solvent system

(9) Yang, Jaehyun a Gu, Yeahyun a Lee, Eunha b Lee, Hyangsook b Park, Sang Han c Cho, Mann Ho c Kim, Yong Ho d Kim, Yong Hoon a,d Kim, Hyoungsub a

a Sungkyunkwan University (South Korea)

b SAMSUNG Electronics (South Korea)

c Yonsei University (South Korea)

d Sungkyunkwan University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; DIMETHYLFORMAMIDE; FIELD EFFECT TRANSISTORS; LAYERED SEMICONDUCTORS; MOLYBDENUM COMPOUNDS; SILICA; SUBSTRATES; THIN FILMS;

AVERAGE NUMBERS; CHEMICAL COMPOSITIONS; CONTROLLABLE GROWTH; CRYSTALLINE QUALITY; DEVICE APPLICATION; MOLYBDENUM DISULFIDE; PRECURSOR SOLUTIONS; SOLUTION-PROCESSING;

SULFUR COMPOUNDS;

EID: 84929441010 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c5nr01486g Document Type: Article

Times cited : (92)

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