SCOPUS 정보 검색 플랫폼

Volumn 5, Issue 31, 2015, Pages 24072-24080

Vertical sidewall electrodes monolithically integrated into 3D glass microfluidic chips using water-assisted femtosecond-laser fabrication for in situ control of electrotaxis

(5) Xu, Jian a Wu, Dong a Ip, Joanna Y b Midorikawa, Katsumi a Sugioka, Koji a

a Institute of Physical and Chemical Research (Japan)

b RIKEN (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; ASPECT RATIO; ELECTRODES; ELECTROLESS PLATING; GLASS; LASER ABLATION; MICROFLUIDICS; MONOLITHIC INTEGRATED CIRCUITS; ULTRASHORT PULSES;

DEPOSITION OF METALS; ELECTROLESS PLATING PROCESS; MICROFLUIDIC STRUCTURES; MONOLITHICALLY INTEGRATED; SIDEWALL ELECTRODES; THREEDIMENSIONAL (3-D); VERTICAL ELECTRODES; WATER-ASSISTED FEMTOSECOND LASER ABLATIONS;

FLUIDIC DEVICES;

EID: 84924663821 PISSN: None EISSN: 20462069 Source Type: Journal
DOI: 10.1039/c5ra00256g Document Type: Article

Times cited : (31)

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