3-dimensional electrode patterning within a microfluidic channel using metal ion implantation

Lab on a Chip

Volumn 10, Issue 6, 2010, Pages 783-788

  Choi, Jae Woo ^a,b   Rosset, Samuel ^a   Niklaus, Muhamed ^a   Adleman, James R ^b   Shea, Herbert ^a   Psaltis, Demetri ^a  

^a EPFL   (Switzerland)

^b California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIMETICONE; METAL ION;

ARTICLE; COLLOID; CONCENTRATION RESPONSE; ELECTRODE; ELECTROPHORESIS; ESCHERICHIA COLI; IMPLANTATION; MICROFLUIDICS; NONHUMAN; PRIORITY JOURNAL; PROCESSING; SIMULATION;

EID: 77949410364     PISSN: 14730197     EISSN: 14730189     Source Type: Journal    
DOI: 10.1039/b917719a     Document Type: Article

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