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Applied Physics A: Materials Science and Processing

Volumn 76, Issue 5, 2003, Pages 857-860

3-D microstructuring inside photosensitive glass by femtosecond laser excitation

(9) Masuda, M a,b Sugioka, K a,b Cheng, Y a Aoki, N a,b Kawachi, M c Shihoyama, K c Toyoda, K b Helvajian, H d Midorikawa, K a

a INST OF PHYS AND CHEMICAL RESEARCH (Japan)

b TOKYO UNIVERSITY OF SCIENCE (Japan)

c Hoya Photonics Corporation (Japan)

d AEROSPACE CORPORATION (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; CHEMICAL RESISTANCE; ETCHING; HARDNESS; HEAT RESISTANCE; LASER BEAM EFFECTS; MICROSTRUCTURE; PHOTOSENSITIVITY; THERMAL EFFECTS; TRANSPARENCY;

FEMTOSECOND LASER EXCITATION; MICROCELLS; MICROCHANNELS; MICROSTRUCTURING;

GLASS;

EID: 0037357191 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-002-1937-z Document Type: Article

Times cited : (240)

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