An overview of highly porous oxide films with tunable thickness prepared by molecular layer deposition

Current Opinion in Solid State and Materials Science

Volumn 19, Issue 2, 2015, Pages 115-125

  Liang, Xinhua ^a   Weimer, Alan W ^b  

^a University of Missouri Rolla   (United States)

^b University of Colorado at Boulder   (United States)

Author keywords

Molecular layer deposition (MLD); Oxidation; Particle; Porous thin films; Ultra thin

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMIC LAYER DEPOSITION; FILM PREPARATION; FUNCTIONAL MATERIALS; GAS PERMEABLE MEMBRANES; METAL NANOPARTICLES; NANOCATALYSTS; OXIDATION; PARTICLES (PARTICULATE MATTER); POLYMER FILMS; POROSITY; SELF ASSEMBLY; SEMICONDUCTING FILMS; THIN FILMS; TITANIUM COMPOUNDS;

MOLECULAR LAYER DEPOSITION; MOLECULAR LAYER DEPOSITIONS (MLD); NANOPARTICLE CATALYSTS; NOVEL FUNCTIONAL MATERIALS; ORGANIC/INORGANIC HYBRIDS; POROUS THIN FILMS; ULTRA-THIN; ULTRA-THIN OXIDE FILMS;

OXIDE FILMS;

EID: 84924221116     PISSN: 13590286     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cossms.2014.08.002     Document Type: Review

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