Investigation of the growth conditions on the nano-structure and electrical properties of ZnS chiral sculptured thin films

Applied Surface Science

Volumn 330, Issue , 2015, Pages 74-84

  Abdi, Fatemeh ^a   Savaloni, Hadi ^a  

^a UNIVERSITY OF TEHRAN   (Iran)

Author keywords

Chiral sculptured; Electrical properties; Nano structure; Resistance; ZnS thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; FIELD EMISSION MICROSCOPES; II-VI SEMICONDUCTORS; NANOSTRUCTURES; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; VOID FRACTION; X RAY DIFFRACTION; ZINC SULFIDE;

CHIRAL SCULPTURED; CHIRAL SCULPTURED THIN FILMS; CRYSTALLOGRAPHIC STRUCTURE; ELECTRICAL RESISTANCE MEASUREMENT; ELECTRICAL RESISTANCES; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; SCULPTURED THIN FILMS; ZNS THIN FILMS;

THIN FILMS;

EID: 84924060125     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2014.12.190     Document Type: Article

References (58)

1. M. Hawkeye, and M.J. Brett J. Vac. Sci. Technol. A 25 2007 1317 1336
2. M.O. Jensen, and M.J. Brett IEEE Trans. Nanotechnol. 4 2005 269 277
3. H.F. Li, A.K. Kar, T. Parker, G.C. Wang, and T.M. Lu Nanotechnology 19 2008 335708
4. F. Wang, and A. Lakhtakia Opt. Commun. 235 2004 133 151
5. F. Wang, and A. Lakhtakia Opt. Commun. 235 2004 107 132
6. J.M. Nieuwenhuizen, and H.B. Haanstra Philips Tech. Rev. 27 1966 87 91
7. R. Messier, and J.E. Yehoda J. Appl. Phys. 58 1985 3739 3746
8. T. Motohiro, and Y. Taga Appl. Opt. 28 1989 2466 2482
9. K. Robbie, and M.J. Brett J. Vac. Sci. Technol. A 15 1997 3
10. H. Savaloni, F. Haydari-Nasab, and M. Malmir Appl. Surf. Sci. 257 2011 9044 9055
11. A. Siabi-Garjan, and H. Savaloni Eur. Phys. J. B 86 2013 257
12. F. Abdi, A. Siabi-Garjan, and H. Savaloni J. Theor. Appl. Phys. 6 2012 11
13. F. Abdi, A. Siabi-Gerjan, and H. Savaloni J. Theor. Appl. Phys. 6 2012 4
14. A. Lakhtakia, and R. Messier Sculptured Thin Films: Nanoengineered Morphology and Optics 2005 Messier, SPIE Bellingham 233
15. K. Robbie, and M.J. Brett Nature London 38 1996 4616 4617
16. I.J. Hodgkinson, Q. Wu, M. Arnold, W. McCall, and A. Lakhtakia Opt. Commun. 210 2002 201 211
17. J.J. Steele, A.C. Van popta, M.M. Hawkeye, J.C. Sit, and M.J. Brett Sens. Actuators B 120 2006 213 219
18. S.V. Kesapragada, O.N.P. Victor, and D. Gall Nano Lett. 6 2006 854 857
19. K.D. Harris, M.J. Brett, T.J. Smy, and C. Backhouse J. Electrochem. Soc. 147 2000 2002 2006
20. A. Lakhtakia, M. Demirel, M. Horn, and J. Xu Adv. Solid State Phys. 46 2007 295 307
21. W.H. Yang, G.C. Schatz, and R.P. Van Duyne J. Chem. Phys. 103 1995 15
22. H. Katayama, S. Oda, and H. Kukimoto Appl. Phys. Lett. 27 1975 657
23. N. Fathy, R. Kobayashi, and M. Ichimura Mater. Sci. Eng. B 107 2004 271
24. I.C. Nducwe Sol. Enrgy Mater. Sol. Cells 40 1996 123
25. R.O. Borges, D. Lincot, J. Vedel, Photovoltaic Solar Energy Conference (PVSEC-6), 1992, p. 862.
26. T.V. Prevenslik J. Lumen. 1210 2000 87 89
27. D. Chen, F. Huang, G. Ren, D. Li, M. Zheng, Y. Wang, and Z. Lin Nanoscale 2 2010 206 2064
28. J.S. Hu, L.L. Ren, Y.G. Guo, H.P. Liang, M.A. Cao, L.J. Wan, and C.L. Bai Angew. Chem. 44 2005 1269 1273
29. S. Kohtani, Y. Ohama, Y. Ohno, I. Tsuji, A. Kudo, and R. Nakagaki Chem. Lett 34 2005 1056 1057
30. M.P. Valkonen, S. Lindroos, T. Kanniainen, M. Leskela, U. Tapper, and E. Kauppinen Appl. Surf. Sci. 120 1997 58 64
31. J.M. Dona, and J. Herrero J. Electrochem. Soc. 141 1994 205
32. Z.J. Xin, R.J. Peaty, H.N. Rutt, and R.W. Eason Semicond. Sci. Technol. 14 1999 695
33. K.A. Dhese, J.E. Nicholls, W.E. Hagston, P.J. Wrigth, B. Cockayne, and J.J. Davies J. Cryst. Growth 138 1994 140
34. J. Ihanus, M. Ritala, M. Leskelaand, T. Prohaska, R. Resch, and G. Friedbacher Appl. Surf. Sci. 120 1997 43
35. J. Lee, S. Lee, S. Cho, S. Kim, I.Y. Park, and Y.D. Choi Mater. Chem. Phys. 77 2002 254 260
36. P.K. Ghosh, S. Jana, S. Nandy, and K.K. Chattopadhyay Mater. Res. Bull. 42 2007 505 514
37. H.J. Lee, and S. Lee Curr. Appl. Phys. 7 2007 193 197
38. J.P. Borah, J. Barman, and K.C. Sarma Chalcogenide Lett. 59 2008 201 208
39. R. Zhang, B. Wang, H. Zhang, and L. Wei Appl. Surf. Sci. 241 2005 435 441
40. A. Ates, M. Yildirim, M. Kundakci, and A. Astam Mater. Sci. Semicond. Process. 10 2007 281 286
41. X. Wu, F. Lai, L. Lin, J. Lv, B. Zhuang, Q. Yan, and Z. Huang Appl. Surf. Sci. 254 2008 6455 6460
42. Y.P. Venkata Subbaiah, P. Prathap, and K.T. Ramakrishna Reddy Appl. Surf. Sci. 253 2006 2409 2415
43. N. Fathy, and M. Ichimura Sol. Enrgy Mater. Sol. Cells 87 2005 747 756
44. M.A. Yildirim, A. Ates, and A. Astam Phys. E 41 2009 1365 1372
45. H.K. Sadekar, N.G. Deshpande, Y.G. Gudage, A. Ghosh, S.D. Chavhan, S.R. Gosavi, and R. Sharma J. Alloys Compd. 453 2008 519 524
46. W. Daranfed, M.S. Aida, A. Hafdallah, and H. Lekiket Thin Solid Films 518 2009 1082 1084
47. H. Savaloni, F. Babaei, S. Song, and F. Placido Appl. Surf. Sci. 255 2009 8041 8047
48. D.J. Srolovitz J. Vac. Sci. Technol. A 4 1986 2925
49. H. Savaloni, S.M. Afzali, Mehran Gholipour Shahraki, J. Sci. I. A. U (JSIAU) 17 (2007) 63.
50. H. Savaloni, and M.G. Shahraki Nanotechnology 15 2004 311 319
51. P. Bai, J.F. McDonald, T.M. Lu, and M.J. Costa J. Vac. Sci. Technol. A 9 1991 2113
52. H. Savaloni, E. Gu, M.A. Player, and G.V. Marr Vacuum 43 1992 965
53. H. Savaloni, S. Bagheri Najmi, Vacuum 66 (2002) 49.
54. H. Savaloni, and A. Esfandiar Appl. Surf. Sci. 257 2011 9425 9434
55. C.M. Zhou, and D. Gall Thin Solid Films 515 2006 1223
56. J.I. Langford, and A.J. Wilson J. Appl. Crystallogr. 11 1978 102 113
57. T.C. Huang, G. Lim, F. Parmigiani, and E. Kay J. Vacuum Sci. Technol. A 3 1985 2161 2166
58. G. Reiss, E. Hastreiter, H. Bruckl, and J. Vancea Phys. Rev. B 43 1991 6