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Volumn 255, Issue 18, 2009, Pages 8041-8047
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Characteristics of sculptured Cu thin films and their optical properties as a function of deposition rate
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Author keywords
AFM; Bruggeman effective medium approximation; Sculptured thin films; SEM; XRD
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
DEPOSITION RATES;
NANOSTRUCTURES;
REFRACTIVE INDEX;
SCANNING ELECTRON MICROSCOPY;
SUBSTRATES;
THIN FILMS;
X RAY DIFFRACTION;
BRUGGEMAN EFFECTIVE MEDIUM APPROXIMATION;
COPPER THIN FILM;
FILM STRUCTURE;
GLASS SUBSTRATES;
METAL INCLUSIONS;
REAL AND IMAGINARY;
SCULPTURED THIN FILMS;
SPECTRAL RANGE;
OPTICAL FILMS;
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EID: 67549104861
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2009.05.011 Document Type: Article |
Times cited : (44)
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References (25)
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