Altering properties of cerium oxide thin films by Rh doping

Materials Research Bulletin

Volumn 67, Issue , 2015, Pages 5-13

  Sevcikova, Klára ^a,b   Nehasil, Václav ^a   Vorokhta, Mykhailo ^a   Haviar, Stanislav ^a,c   Matolín, Vladimír ^a   Matolínová, Iva ^a   Mašek, Karel ^a   Píš, Igor ^a,d   Kobayashi, Keisuke ^b,e   Kobata, Masaaki ^b,f   Nagata, Takahiro ^b   Matsushita, Yoshitaka ^b   Yoshikawa, Hideki ^b  

^a CHARLES UNIVERSITY   (Czech Republic)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^d BACH Beamline Sincrotrone Trieste SCpA   (Italy)

^e JAPAN ATOMIC ENERGY AGENCY   (Japan)

^f HIROSHIMA UNIVERSITY   (Japan)

Author keywords

A. Oxides; C. Photoelectron spectroscopy; D. Catalytic properties; D. Diffusion; D. Electronic structure

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; CERIUM; CERIUM COMPOUNDS; ELECTRONIC STRUCTURE; FILMS; MAGNETRON SPUTTERING; MATERIALS PROPERTIES; OXIDE FILMS; PHOTOELECTRONS; PHOTONS; SEMICONDUCTOR DOPING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY POWDER DIFFRACTION;

ALTERING PROPERTIES; CATALYTIC APPLICATIONS; CATALYTIC PROPERTIES; CERIUM OXIDE THIN FILMS; CHEMICAL COMPOSITIONS; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; RF-MAGNETRON SPUTTERING; TEMPERATURE PROGRAMMED REACTIONS;

RHODIUM;

EID: 84923862977     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2015.02.059     Document Type: Article

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