Characterization of sub-stoichiometric rhodium oxide deposited by magnetron sputtering

Surface Science

Volumn 602, Issue 21, 2008, Pages 3375-3380

  Marot, Laurent ^a   Mathys, D ^a   Temmerman, Gregory De ^b   Oelhafen, Peter ^a  

^a UNIVERSITY OF BASEL   (Switzerland)

^b CULHAM SCIENCE CENTRE   (United Kingdom)

Author keywords

Rhodium; Sputter deposition; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

AERODYNAMICS; AMORPHOUS FILMS; CHEMICAL BONDS; DESCALING; FILM PREPARATION; FLOW OF GASES; GAS DYNAMICS; MAGNETRON SPUTTERING; MAGNETRONS; NONMETALS; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PLASMAS; REFLECTION; RHODIUM; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SPUTTER DEPOSITION; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS; CHEMICAL BONDINGS; CRYSTALLINITY; HIGH RESISTIVITIES; METALLIC COMPONENTS; OPTICAL REFLECTIVITIES; OXYGEN FLOW RATIOS; OXYGEN GAS FLOWS; REFLECTIVITY MEASUREMENTS; RHODIUM OXIDES; ROOM TEMPERATURES; SEMICONDUCTING PROPERTIES; SILICON SUBSTRATES; X-RAY DIFFRACTION;

OXIDE FILMS;

EID: 54249101286     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2008.09.012     Document Type: Article

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