The effect of the substrate on thermal stability of CeOxand Rh-Ce-O thin films

Surface and Interface Analysis

Volumn 46, Issue 10-11, 2014, Pages 980-983

  Ševčíková, Klára ^a   Nehasil, Václav ^a   Zahoranová, Tatiana ^a   Vorokhta, Mykhaylo ^a   Tsud, Nataliya ^a   Yoshikawa, Hideki ^b   Kobata, Masaaki ^c   Kobayashi, Keisuke ^d   Matolín, Vladimír ^a  

^a CHARLES UNIVERSITY   (Czech Republic)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c JAPAN ATOMIC ENERGY AGENCY   (Japan)

^d HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Ceria; Cerium silicate; Mixed oxide; Photoelectron spectroscopy; Rhodium; Thin film

Indexed keywords

CATALYST ACTIVITY; CERIUM COMPOUNDS; CERIUM OXIDE; COPPER; MAGNETRON SPUTTERING; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTONS; PRECIOUS METALS; RHODIUM; RHODIUM METALLOGRAPHY; SILICA; SILICATES; SILICON; SILICON OXIDES; STABILITY; SUBSTRATES; THERMODYNAMIC STABILITY; THIN FILMS;

CU SUBSTRATE; MIXED OXIDE; OVERLAYERS; RADIO FREQUENCY MAGNETRON SPUTTERING; STRONG INTERACTION;

RHODIUM COMPOUNDS;

EID: 84908154247     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.5503     Document Type: Article

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