Parallel near-field photolithography with metal-coated elastomeric masks

Langmuir

Volumn 31, Issue 3, 2015, Pages 1210-1217

  Wu, Jin ^c   Yu, Cheng Han ^d   Li, Shaozhou ^c,f   Zou, Binghua ^a,c   Liu, Yayuan ^c   Zhu, Xiaoqun ^c   Guo, Yuanyuan ^c   Xu, Hongbo ^c   Zhang, Weina ^c   Zhang, Liping ^c,e   Liu, Bin ^e   Tian, Danbi ^b   Huang, Wei ^a   Sheetz, Michael P ^d   Huo, Fengwei ^a,c  

^a Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM)   (China)

^b NANJING TECH UNIVERSITY   (China)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^d NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^e Nanyang Technological University   (Singapore)

^f NANJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; NANOLITHOGRAPHY; PHOTOLITHOGRAPHY; PHOTORESISTS;

ACADEMIC RESEARCH; CELL-MATRIX ADHESION; CENTIMETER-SCALE; NANOLITHOGRAPHIC TECHNIQUES; NEAR-FIELD PHOTOLITHOGRAPHY; NEGATIVE TONE PHOTORESIST; PRODUCTION CAPABILITIES; SUBWAVELENGTH APERTURES;

METAL COATINGS;

DIMETICONE; GOLD; NANOMATERIAL; POLY(METHYL METHACRYLATE);

CHEMISTRY; DEVICES; ELASTICITY; ELECTROCHEMICAL ANALYSIS; NANOTECHNOLOGY; PARTICLE SIZE; PRINTING; PROCEDURES;

DIMETHYLPOLYSILOXANES; ELASTICITY; ELECTROCHEMICAL TECHNIQUES; GOLD; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; POLYMETHYL METHACRYLATE; PRINTING;

EID: 84921730726     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la504260x     Document Type: Article

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