Morphological and electrical characterization of FIB implanted diamond surfaces

Microelectronic Engineering

Volumn 141, Issue , 2015, Pages 27-31

  Pea, M ^a   Giovine, E ^a   Di Gioacchino, D ^b   Marcelli, A ^b,c   Della Ventura, G ^d   Pace, E ^b,e   Notargiacomo, A ^a  

^a IFN CNR   (Italy)

^b INFN LABORATORI NAZIONALI DI FRASCATI   (Italy)

^c RICMASS Via Dei Sabelli 119A   (Italy)

^d ROMA TRE UNIVERSITY   (Italy)

^e UNIVERSITY OF FLORENCE   (Italy)

Author keywords

Atomic force microscopy; Diamond; Focused ion beam; Ion implantation; Resistivity

Indexed keywords

AMORPHOUS CARBON; ATOMIC FORCE MICROSCOPY; CARBON; CARBON FILMS; DIAMOND FILMS; DIAMONDS; ELECTRIC CONDUCTIVITY; FOCUSED ION BEAMS; ION BEAMS; ION IMPLANTATION; IONS; MAPS;

AMORPHOUS CARBON LAYER; CONDUCTIVE BEHAVIOR; CURRENT VOLTAGE MEASUREMENT; ELECTRICAL CHARACTERIZATION; PRECISE MEASUREMENTS; SELECTIVE REMOVAL; SURFACE CONDUCTION; THEORETICAL CALCULATIONS;

AMORPHOUS FILMS;

EID: 84921492701     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2015.01.004     Document Type: Article

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