Interior-architectured ZnO nanostructure for enhanced electrical conductivity via stepwise fabrication process

Nanoscale Research Letters

Volumn 9, Issue 1, 2014, Pages

  Chong, Eugene ^a,d   Kim, Sarah ^a   Choi, Jun Hyuk ^a   Choi, Dae Geun ^a,b   Jung, Joo Yun ^a   Jeong, Jun Ho ^a,b   Lee, Eung sug ^a   Lee, Jaewhan ^a,d   Park, Inkyu ^c   Lee, Jihye ^a,b  

^a Korea Institute of Machine and Materials   (South Korea)

^b University of Science and Technology (UST)   (South Korea)

^c Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^d Agency for Defence Development   (South Korea)

Author keywords

Electrical conductivity; Hydrothermal growth; Interior architecturing; Nanoimprint Lithography(NIL); Zinc oxide (ZnO); ZnO nanostructure

Indexed keywords

COSTS; ELECTRIC CONDUCTIVITY; FABRICATION; II-VI SEMICONDUCTORS; LIGHT EMISSION; MORPHOLOGY; NANOCRYSTALS; NANOIMPRINT LITHOGRAPHY; SOL-GEL PROCESS; SUBSTRATES; TEMPERATURE;

ELECTRICAL CHARACTERISTIC; ELECTRICAL CONDUCTIVITY; HYDROTHERMAL GROWTH; NANOIMPRINT LITHOGRAPHY PROCESS; OPTICAL CHARACTERISTICS; RIGID AND FLEXIBLE SUBSTRATES; ZINC OXIDE (ZNO); ZNO NANOSTRUCTURES;

ZINC OXIDE;

EID: 84919884580     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-9-428     Document Type: Article

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