Optimization and characterization of NiO thin film and the influence of thickness on the electrical properties of n-ZnO nanorods/p-NiO heterojunction

Semiconductor Science and Technology

Volumn 29, Issue 11, 2014, Pages

  Echresh, Ahmad ^a,b   Ali Abbasi, Mazhar ^a   Zargar Shoushtari, Morteza ^b   Farbod, Mansoor ^b   Nur, Omer ^a   Willander, Magnus ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b SHAHID CHAMRAN UNIVERSITY OF AHVAZ   (Iran)

Author keywords

electrical properties; heterojunction; NiO thin film; ZnO nanorods

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; FILM THICKNESS; HETEROJUNCTIONS; NANORODS; SCANNING ELECTRON MICROSCOPY; THRESHOLD VOLTAGE; X RAY DIFFRACTION; ZINC OXIDE;

ALIGNED ZNO NANORODS; CURRENT VOLTAGE MEASUREMENT; NIO THIN FILM; PREFERENTIAL ORIENTATION; RECTIFYING BEHAVIORS; SERIES RESISTANCES; SYNTHESIS OPTIMIZATION; ZNO NANOROD;

THIN FILMS;

EID: 84908032430     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/29/11/115009     Document Type: Article

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