|
Volumn 519, Issue 9, 2011, Pages 2737-2741
|
Near infra-red Mueller matrix imaging system and application to retardance imaging of strain
|
Author keywords
Ellipsometry; Imaging; Mueller matrix; Polarimetry; Silicon wafer; Strain imaging
|
Indexed keywords
IMAGING;
IMAGING ELLIPSOMETER;
MUELLER MATRIX;
MULTI-CRYSTALLINE SILICON;
NEAR INFRARED;
POLARIMETRY;
RETARDANCE;
STRAIN IMAGING;
TRANSPARENT SOLIDS;
ELLIPSOMETRY;
POLARIMETERS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
|
EID: 79952624198
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.12.093 Document Type: Article |
Times cited : (23)
|
References (26)
|