Optimization on illumination source with design of experiments

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Hu, Helen ^a   Zou, Yi ^a   Deng, Yunfei ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

DOE; Illumination; Response Surface Methodology; Source Optimization

Indexed keywords

LIGHTING; PHOTOLITHOGRAPHY; SURFACE PROPERTIES;

COMPUTATION EFFORT; COMPUTATION SIMULATION; DOE; ILLUMINATION SOURCES; PHOTOLITHOGRAPHY PROCESS; RESPONSE FUNCTIONS; RESPONSE SURFACE METHODOLOGY; SOURCE OPTIMIZATION;

DESIGN OF EXPERIMENTS;

EID: 84861492902     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.848876     Document Type: Conference Paper

References (7)

1. Rosenbluth, A.E., Melville, D. O., Tian, K., Bagheri, S., Azpiroz, J.T., Lai, K., Waechter, A., Inoue, T., Ladanyi, L., Barahona, F., Scheinberg, K., Sakamoto, M., Muta H., Gallagher, E., Faure, T., Faure, T., Hibbs, M., Tritchkov, A., and Granik, Y., "Intensive Optimization of Masks and Sources for 22nm Lithography", Proc. of SPIE, Vol. 7274 (2009).
2. Tolani, V., Hu, P., Peng, D., Sinn, R., Pang, L. and and Gleason, B., "Source-Mask co-Optimization (SMO) using Level Set Methods", Photomask Technology, Proc. of SPIE, Vol. 7488 (2009).
3. Deng, Y.F., Zou, Y., Yoshimoto, K., Ma, Y.S., Tabery, C.E., Kye, J., Capodieci, L., Levinson, H.J., "Considerations in source-mask optimization for logic applications", Proc. of SPIE, Vol. 7460-53 (2010).
4. Zou, Y., Deng, Y.F., Kye, J., Capodieci, L., and Tabery, C.E., "Evaluation of Lithographic Benefits of using ILT Techniques for 22nm-node", Proc. of SPIE, Vol. 7640-20 (2010).
5. Montgomery, D.C., "Design and Analysis of Experiments", 6th edition, John Wiley and Sons (2005).
6. Myers, R.H., Montgomery, D.C., "Response Surface Methodology", 2nd edition, John Wiley and Sons (2009).
7. SAS JMP 8.0.1. User help manual.