Evaluation of lithographic benefits of using ILT techniques for 22nm-node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Zou, Yi ^a   Deng, Yunfei ^a   Kye, Jongwook ^a   Capodieci, Luigi ^a   Tabery, Cyrus ^a   Dam, Thuc ^b   Aadamov, Anthony ^b   Baik, Ki Ho ^b   Pang, Linyong ^b   Gleason, Bob ^b  

^a IBM MICROELECTRONICS   (United States)

^b Luminescent Technologies   (United States)

Author keywords

assist feature (AF); computational lithography; Inverse Lithography Technologies (ILT); mask optimization (MO); Source Mask Optimization (SMO); source optimization (SO)

Indexed keywords

MASKS;

ASSIST FEATURES; COMPUTATIONAL LITHOGRAPHIES; INVERSE LITHOGRAPHY TECHNOLOGIES; MASK OPTIMIZATION; SOURCE MASK OPTIMIZATION (SMO); SOURCE OPTIMIZATION;

STATIC RANDOM ACCESS STORAGE;

EID: 79959228403     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.848479     Document Type: Conference Paper

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