Diffusion of oxygen in amorphous Al2O3, Ta 2O5, and Nb2O5

Journal of Applied Physics

Volumn 116, Issue 3, 2014, Pages

  Nakamura, R ^a   Toda, T ^b   Tsukui, S ^a   Tane, M ^b   Ishimaru, M ^c   Suzuki, T ^b   Nakajima, H ^d  

^a Osaka Prefecture University   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^d WAKASA WAN ENERGY RESEARCH CENTER   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ALUMINUM; AMORPHOUS MATERIALS; DIFFUSION; ENTROPY; NIOBIUM OXIDE; OXYGEN; TANTALUM; TANTALUM OXIDES;

ACTIVATION ENTROPIES; ATOMIC CONFIGURATION; DIFFUSION OF OXYGENS; LOW-ACTIVATION ENERGY; PAIR DISTRIBUTION FUNCTIONS; PREEXPONENTIAL FACTOR; SHORT-RANGE STRUCTURE; VACANCY-LIKE DEFECTS;

NIOBIUM;

EID: 84904655076     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4889800     Document Type: Article

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