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Volumn 113, Issue 6, 2013, Pages

Atomic rearrangements in amorphous Al2O3 under electron-beam irradiation

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION VOLTAGES; AMORPHOUS STATE; ATOMIC REARRANGEMENTS; BASIC UNITS; CRYSTALLINE GRAINS; ELECTRON ENERGIES; ELECTRON-BEAM IRRADIATIONS; ELECTRONIC EXCITATION; IN-SITU TRANSMISSION ELECTRON MICROSCOPIES; NANO-VOIDS; RADIAL DISTRIBUTION ANALYSIS;

EID: 84874332096     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4790705     Document Type: Article
Times cited : (70)

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    • 3 film (a) before and (b) after irradiation at 200 keV. The arrows in the BFIs indicate an identical indium nanoparticle before and after irradiation.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.