Comparative Studies on Oxygen Diffusion Coefficients for Amorphous and γ-al2o3 Films using 18O Isotope

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 12, 2003, Pages 7205-7208

  Nabatame, Toshihide ^a   Yasuda, Tetsuji ^a   Nishizawa, Masayasu ^a   Ikeda, Minoru ^a   Horikawa, Tsuyoshi ^a   Toriumi, Akira ^a,b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

18O Isotope; ALD Al2O3; Oxygen diffusion coefficient; Al2O3 film

Indexed keywords

ACTIVATION ENERGY; CMOS INTEGRATED CIRCUITS; DIFFUSION; ELECTRON ENERGY LOSS SPECTROSCOPY; GRAIN BOUNDARIES; HEAT TREATMENT; ISOTOPES; OXYGEN; RADIOACTIVE TRACERS; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

18O ISOTOPE; ALD-AL2O3; OXYGEN DIFFUSION COEFFICIENT; Υ-AL2O3 FILM;

ALUMINA;

EID: 1242310378     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.7205     Document Type: Article

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