Application of nano-diffraction to local atomic distribution function analysis of amorphous materials

Journal of Electron Microscopy

Volumn 50, Issue 6, 2001, Pages 435-442

  Hirotsu, Yoshihiko ^a   Ishimaru, Manabu ^a   Ohkubo, Tadakatsu ^a   Hanada, Takeshi ^a   Sugiyama, Masaaki ^b  

^a OSAKA UNIVERSITY   (Japan)

^b NIPPON STEEL CORPORATION   (Japan)

Author keywords

Amorphous materials; Distribution function analysis; Imaging plate; Nano diffraction; SiO2; Structure analysis

Indexed keywords

CONFERENCE PAPER;

AMORPHOUS SILICON; ATOMS; CRYSTAL ATOMIC STRUCTURE; DISTRIBUTION FUNCTIONS; ELECTRON DIFFRACTION; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ELECTRONS; ENERGY DISSIPATION; ION IMPLANTATION; PLATES (STRUCTURAL COMPONENTS); SILICON CARBIDE; SINGLE CRYSTALS; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC DISTRIBUTION; DIFFRACTION INTENSITY; DISTRIBUTION FUNCTION ANALYSE; DISTRIBUTION-FUNCTIONS; FUNCTION ANALYSIS; IMAGING PLATE; INTENSITY ANALYSIS; NANO SIZED; NANO-DIFFRACTION; STRUCTURE ANALYSIS;

SILICA;

EID: 0035572915     PISSN: 00220744     EISSN: None     Source Type: Journal    
DOI: 10.1093/jmicro/50.6.435     Document Type: Article

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