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Acta Materialia

Volumn 59, Issue 11, 2011, Pages 4631-4640

Nanovoid formation by change in amorphous structure through the annealing of amorphous Al2O3 thin films

(7) Tane, M a Nakano, S a Nakamura, R a Ogi, H a Ishimaru, M a Kimizuka, H a Nakajima, H a

a OSAKA UNIVERSITY (Japan)

Author keywords

Amorphous oxides; Elastic properties; Molecular dynamics simulations; Nanoporous; Nanovoid

Indexed keywords

AMORPHOUS OXIDES; ELASTIC PROPERTIES; MOLECULAR DYNAMICS SIMULATIONS; NANO-POROUS; NANOVOID;

ALUMINUM; ANNEALING; CHEMICAL MODIFICATION; ELECTRON BEAMS; MOLECULAR DYNAMICS; STIFFNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 79956006968 PISSN: 13596454 EISSN: None Source Type: Journal
DOI: 10.1016/j.actamat.2011.04.008 Document Type: Article

Times cited : (22)

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