Self-aligned Cu etch mask for individually addressable metallic and semiconducting carbon nanotubes

ACS Nano

Volumn 8, Issue 6, 2014, Pages 6500-6508

  Jiang, Yiran ^a   Xiong, Feng ^a,b   Tsai, Cheng Lin ^a   Ozel, Taner ^a   Pop, Eric ^b   Shim, Moonsub ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b Stanford University   (United States)

Author keywords

aligned; carbon nanotubes; electronic selection; individually addressable

Indexed keywords

CARBON NANOTUBES; PHOTORESISTS; SINGLE-WALLED CARBON NANOTUBES (SWCN);

ALIGNED; AVERAGE NUMBERS; CHANNEL WIDTHS; DETERMINISTIC APPROACH; ELECTRICAL BREAKDOWN; ELECTRONIC SELECTION; INDIVIDUALLY ADDRESSABLE; SEMICONDUCTING CARBON NANOTUBES;

ELECTRIC BREAKDOWN OF LIQUIDS;

EID: 84903478625     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn502390r     Document Type: Article

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