Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method

Journal of Physics: Conference Series

Volumn 518, Issue 1, 2014, Pages

  Ichida, D ^a   Uchida, G ^b   Seo, H ^a   Kamataki, K ^a   Itagaki, N ^a,c   Koga, K ^a   Shiratani, M ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CRYSTALLINE MATERIALS; DEPOSITION; GERMANIUM; METALLIC FILMS; NANOPARTICLES; X RAY DIFFRACTION;

FILM CRYSTALLINITY; GE NANOPARTICLES; HIGH-PRESSURE CONDITION; PEAK FREQUENCIES; RADIO FREQUENCY MAGNETRON SPUTTERING METHOD; RF MAGNETRON SPUTTERING METHOD; SUBSTRATE TEMPERATURE; X-RAY DIFFRACTION SPECTRUM;

MAGNETRON SPUTTERING;

EID: 84903471907     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/518/1/012002     Document Type: Conference Paper

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