Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 8, Issue 10, 2011, Pages 3017-3020

  Uchida, Giichiro ^a   Yamamoto, Kosuke ^a   Kawashima, Yuki ^a   Sato, Muneharu ^a   Nakahara, Kenta ^a   Kamataki, Kunihiro ^a   Itagaki, Naho ^a   Koga, Kazunori ^a   Kondo, Michio ^b   Shiratani, Masaharu ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Nitridation; Photoluminescence; Plasma CVD; Si nanoparticles

Indexed keywords

DISCHARGE PLASMA; NITROGEN CONTENT; NUMBER DENSITY; PEAK ENERGY; PHOTOLUMINESCENCE EMISSION; PLASMA CVD; SI NANOPARTICLES; SI-PARTICLE; SILICON PARTICLES; SURFACE LAYERS; SURFACE NITRIDATION;

ELECTRIC DISCHARGES; NANOPARTICLES; NITRIDATION; NITROGEN PLASMA; PHOTOLUMINESCENCE; PLASMA THEORY;

SILICON;

EID: 80053608099     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201001230     Document Type: Article

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