In-situ spectroscopic ellipsometry study of copper selective-area atomic layer deposition on palladium

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 32, Issue 4, 2014, Pages

  Jiang, Xiaoqiang ^a   Wang, Han ^a   Qi, Jie ^a   Willis, Brian G ^a  

^a UNIVERSITY OF CONNECTICUT   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; COPPER; DEPOSITION; SILICON NITRIDE; SPECTROSCOPIC ELLIPSOMETRY; VAPORS;

ADSORPTION/DESORPTION; IN-SITU ELLIPSOMETRY; LOW GROWTH TEMPERATURE; OPTIMAL CONDITIONS; PRECURSOR ADSORPTION; REACTION CHARACTERISTICS; REAL TIME SPECTROSCOPIC ELLIPSOMETRY; SELECTIVE-AREA ATOMIC LAYER DEPOSITION;

PALLADIUM;

EID: 84902827789     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4884535     Document Type: Article

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