Analysis of electron beam damage of exfoliated MoS2 sheets and quantitative HAADF-STEM imaging

Ultramicroscopy

Volumn 146, Issue , 2014, Pages 33-38

  Garcia, Alejandra ^a,d   Raya, Andres M ^b   Mariscal, Marcelo M ^c   Esparza, Rodrigo ^a,e   Herrera, Miriam ^b   Molina, Sergio I ^b   Scavello, Giovanni ^b   Galindo, Pedro L ^b   Jose Yacaman, Miguel ^a   Ponce, Arturo ^a  

^a UNIVERSITY OF TEXAS AT SAN ANTONIO   (United States)

^b UNIVERSITY OF CÁDIZ   (Spain)

^c DEPARTAMENTO DE FISICOQUÍMICA   (Argentina)

^d Departamento de Ingeniería Informática CASEM Universidad de Cádiz ^*  (Mexico)

^e CENTRO DE FÍSICA APLICADA Y TECNOLOGÍA AVANZADA   (Mexico)

Author keywords

Aberration corrected microscopy; Low voltage transmission electron microscopy; Molybdenum disulfide; Radiation damage

Indexed keywords

ELECTRON BEAMS; RADIATION DAMAGE; SURFACE DEFECTS; TRANSMISSION ELECTRON MICROSCOPY;

ABERRATION-CORRECTED MICROSCOPIES; ABERRATION-CORRECTED SCANNING TRANSMISSION ELECTRON MICROSCOPIES; ELECTRON BEAM DAMAGE; ELECTRON BEAM IRRADIATION; LOW-VOLTAGE TRANSMISSION ELECTRON MICROSCOPIES; MOLYBDENUM DISULFIDE; STRUCTURAL DAMAGES; THEORETICAL CALCULATIONS; HAADF STEM IMAGING;

MOLYBDENUM COMPOUNDS; RADIATION DAMAGE;

LITHIUM; MOLYBDENUM; SULFUR; INORGANIC COMPOUND; MOLYBDENUM DISULFIDE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL BINDING; ELECTRON BEAM; HIGH ANGLE ANNULAR DARK FIELD DETECTOR; IMAGE ANALYSIS; MOLECULAR INTERACTION; MOLECULAR STABILITY; PREDICTION; QUANTITATIVE ANALYSIS; RADIATION DETECTOR; SCANNING TRANSMISSION ELECTRON MICROSCOPY; STRUCTURE ANALYSIS; SURFACE PROPERTY; ANALYTIC METHOD; CHEMICAL INTERACTION; COMPUTER PROGRAM; COMPUTER SIMULATION; CONCENTRATION (PARAMETERS); HIGH ANGLE ANNULAR DARK FIELD; INTERCALATION COMPLEX; LIGHT SCATTERING; SEMICONDUCTOR;

EID: 84902355461     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2014.05.004     Document Type: Article

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