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Volumn 115, Issue 18, 2014, Pages

Electrical response in atomic layer deposited Al:ZnO with varying stack thickness

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMIC LAYER DEPOSITION; CARRIER CONCENTRATION; FILM GROWTH; ZINC;

EID: 84901497149     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4875536     Document Type: Article
Times cited : (10)

References (27)
  • 18
    • 84941438060 scopus 로고
    • 10.1109/JQE.1986.1073179
    • G. Döhler, IEEE J. Quantum Electron. 22, 1682-1695 (1986). 10.1109/JQE.1986.1073179
    • (1986) IEEE J. Quantum Electron. , vol.22 , pp. 1682-1695
    • Döhler, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.