Work function changes of plasma treated indium tin oxide

Organic Electronics

Volumn 15, Issue 8, 2014, Pages 1731-1737

  He, Kongduo ^a   Yang, Xilu ^a   Yan, Hang ^a   Wu, Zhonghang ^a   Li, Zebin ^a   Zhong, Shaofeng ^a   Ou, Qiongrong ^a,b   Liang, Rongqing ^a,b  

^a FUDAN UNIVERSITY   (China)

^b BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

Exponential decrease; First order reaction; Indium tin oxide; Linear decrease; Plasma; Work function

Indexed keywords

CHLORINE COMPOUNDS; INDIUM COMPOUNDS; OPTOELECTRONIC DEVICES; PLASMA APPLICATIONS; PLASMAS; TIN OXIDES; WORK FUNCTION;

EXPONENTIAL DECREASE; FIRST ORDER REACTIONS; INDIUM TIN OXIDE; LINEAR DECREASE; ORGANIC OPTOELECTRONICS; PLASMA TREATMENT; SURFACE TREATED; WORK FUNCTION CHANGE;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84901403050     PISSN: 15661199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.orgel.2014.05.008     Document Type: Article

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