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Journal of Alloys and Compounds

Volumn 609, Issue , 2014, Pages 111-115

Effect of Al/Cu ratios on the optical, electrical, and electrochemical properties of Cu-Al-Ca-O thin films

(6) Cheng, I Chun a Chang, Shih Hang b Lin, Guan Wei c Chi, Chu Te a Hsiao, Sou Hui b Chen, Jian Zhang c

a NATIONAL TAIWAN UNIVERSITY (Taiwan)

b NATIONAL ILAN UNIVERSITY (Taiwan)

c NATIONAL TAIWAN UNIVERSITY (Taiwan)

Author keywords

Cu Al Ca O thin films; Electrical property; Electrochemical property; Heterojunction diode; Transparent conducting oxide

Indexed keywords

AMORPHOUS FILMS; CALCIUM; COPPER; CORROSION RESISTANCE; ELECTRIC PROPERTIES; ELECTROCHEMICAL PROPERTIES; HETEROJUNCTIONS; SEMICONDUCTOR DIODES; THIN FILMS; ZINC OXIDE;

AL-DOPED ZNO; CORROSION CURRENT DENSITIES; DEPOSITED FILMS; HETEROJUNCTION DIODES; HIGH AL; P-LAYER; RECTIFICATION RATIO; TRANSPARENT CONDUCTING OXIDE;

ALUMINUM;

EID: 84900986611 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2014.04.146 Document Type: Article

Times cited : (10)

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