Preparation of transparent CuCrO2:Mg/ZnO p-n junctions by pulsed laser deposition

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2415-2418

  Tonooka, Kazuhiko ^a   Kikuchi, Naoto ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Mg doped CuCrO2; Oxide semiconductor; Transparent conducting oxide p n junction; ZnO

Indexed keywords

COPPER COMPOUNDS; CURRENT VOLTAGE CHARACTERISTICS; GLASS; PULSED LASER DEPOSITION;

CURRENT-VOLTAGE CURVES; INDIUM TIN OXIDE (ITO) FILMS; OPTICAL TRANSPARENCY; SEMICONDUCTOR LAYER;

SEMICONDUCTOR JUNCTIONS;

EID: 33750827321     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.05.023     Document Type: Article

References (12)

1. Kudo A., Yanagi H., Ueda K., Hosono H., and Kawazoe H. Appl. Phys. Lett. 75 (1999) 2851
2. Ohta H., Kawamura K., Orita M., Hirano M., Sarukura N., and Hosono H. Appl. Phys. Lett. 77 (2000) 475
3. Aoki T., Hatanaka Y., and Look D.C. Appl. Phys. Lett. 76 (2000) 3257
4. Hoffman R.L., Wager J.F., Jayaraj M.K., and Tate J. J. Appl. Phys. 90 (2001) 5763
5. Yanagi H., Ueda K., Ohta H., Orita M., Hirano M., and Hosono H. Solid State Commun. 121 (2002) 15
6. Tonooka K., Bando H., and Aiura Y. Thin Solid Films 445 (2003) 327
7. Ohta H., Mizoguchi H., Hirano M., Narushima S., Kamiya T., and Hosono H. Appl. Phys. Lett. 82 (2003) 823
8. Benko F.A., and Koffyberg F.P. Mater. Res. Bull. 21 (1986) 753
9. Nagarajan R., Draeseke A.D., Sleight A.W., and Tate J. J. Appl. Phys. 89 (2001) 8022
10. Yanagi H., Hase T., Ibuki S., Ueda K., and Hosono H. Appl. Phys. Lett. 78 (2001) 1583
11. Otabe T., Ueda K., Kudoh A., Hosono H., and Kawazoe H. Appl. Phys. Lett. 72 (1998) 1036
12. Grove A.S. Physics and Technology of Semiconductor Devices (1967), Wiley, New York