Influence of annealing temperature on properties of room-temperature rf-sputtered CuAlOx:Ca thin films

Thin Solid Films

Volumn 550, Issue , 2014, Pages 591-594

  Huang, Bo Wei ^a   Chen, Jian Zhang ^a   Cheng, I Chun ^b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Annealing temperature; Calcium doped copper aluminum oxide; Copper aluminum oxide; Heterojunction diodes; Sputtering

Indexed keywords

ANNEALING TEMPERATURES; COPPER ALUMINUM OXIDES; HALL MEASUREMENTS; HETEROJUNCTION DIODES; NANOCRYSTALLINE PHASE; P-TYPE CONDUCTIVITY; ROOM TEMPERATURE; SEEBECK COEFFICIENT MEASUREMENT;

CALCIUM; COPPER; CRYSTALLINE MATERIALS; HETEROJUNCTIONS; INTERFACES (MATERIALS); OXIDES; SEMICONDUCTOR DIODES; SPUTTERING; THIN FILMS;

ANNEALING;

EID: 84890309892     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.11.086     Document Type: Article

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