Nano-dot markers for electron tomography formed by electron beam-induced deposition: Nanoparticle agglomerates application

Ultramicroscopy

Volumn 144, Issue , 2014, Pages 50-57

  Hayashida, Misa ^a   Malac, Marek ^b,c   Bergen, Michael ^b   Li, Peng ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^c UNIVERSITY OF ALBERTA   (Canada)

Author keywords

Electron beam induced deposition; Electron tomography; FIB sample preparation; Fiducial marker; Nano dot marker; Nanoparticle agglomerate

Indexed keywords

AGGLOMERATION; ALIGNMENT; DEPOSITION; ELECTRIC IMPEDANCE TOMOGRAPHY; NANOPARTICLES;

ELECTRON BEAM-INDUCED DEPOSITION; ELECTRON TOMOGRAPHY; FIDUCIAL MARKER; NANODOTS; NANOPARTICLE AGGLOMERATES; SAMPLE PREPARATION;

ELECTRON BEAMS;

QUANTUM DOT; TUNGSTEN;

ACCURACY; ARTICLE; ELECTRON BEAM; ELECTRON TOMOGRAPHY; IMAGE ANALYSIS; NANOFABRICATION; SCANNING ELECTRON MICROSCOPE;

EID: 84900483682     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2014.04.005     Document Type: Article

References (20)

1. Frank J. Principles of electron tomography. Electron Tomography: Three-dimensional Imaging with the Transmission Electron Microscope 1992, 1-13. Plenum Press, New York, London. J. Frank (Ed.).
2. Lawrence M.C. Least-squares methods of alignment using markers. Electron Tomography 1992, 197-204. Plenum Press, New York. J. Frank (Ed.).
3. Mastronarde D.N. Fiducial marker and hybrid alignment methods for single- and double-axis tomography. Electron Tomography: Methods for Three-Dimensional Visualization of Structures in the Cell 2006, 163-185. Springer, New York. J. Frank (Ed.).
4. Kawase N., Kato M., Nishioka H., Jinnai H. Transmission electron microtomography without the missing wedge for quantitative structural analysis. Ultramicroscopy 2007, 107:8-15.
5. Hayashida M., Iijima T., Fujimoto T., Ogawa S. Position-controlled marker formation by helium ion microscope for aligning a TEM tomographic tilt series. Micron 2012, 43:992-995.
6. Hayashida M., Iijima T., Tsukahara M., Ogawa S. High-precision alignment of electron tomography tilt series using markers formed in helium-ion microscope. Micron 2013, 50:29-34.
7. Bergen M., McLeod R.A., Malac M., Hoyle D., Taniguchi Y., Yaguchi T., Chen J., Yotsuji T. Centralized instrument control for a TEM laboratory. Microsc. Microanal. 2013, 19(Suppl. 2):S1394-S1395.
8. Yaguchi T., Konno M., Kamino T., Watanabe M. Observation of three-dimensional elemental distributions of a Si device using a 360 degree-tilt FIB and the cold field-emission STEM system. Ultramicroscopy 2008, 108:1603-1615.
9. Tanaka M., Chu F., Shimojo M., Takeguchi M., Mitsuishi K., Furuya K. Position- and size-controlled fabrication of iron silicide nanorods by electron-beam-induced deposition using an ultrahigh-vacuum transmission electron microscope. Appl. Phys. Lett. 2005, 86:183104.
10. Tanaka M., Shimojo M., Han M., Mitsuishi K., Furuya K. Ultimate sized nano-dots formed by electron beam-induced deposition using an ultrahigh vacuum transmission electron microscope. Surf. Interf. Anal. 2005, 37:261-264.
11. Furuya K., Mitsuishi K., Shimojo M., Song M., Tanaka M., Takeguchi M. Electron beam induced deposition of position and size controlled structures on the nanometre scale. Microsc. Semicond. Mater. Springer Proc. Phys. 2005, 107:239-242.
12. Sychugov I., Nakayama Y., Mitsuishi K. Composition control of electron beam induced nanodeposits by surface pretreatment and beam focusing. J. Phys. Chem. C 2009, 113(52):21516-21519.
13. Silvis-Cividjian N., Hagen C.W., Kruit P. Spatial resolution limits in electron-beam-induced deposition. J. Appl. Phys. 2005, 98:084905.
14. Malac M., Egerton R., Freeman M., Lau J., Zhu Y., Wu L. Electron-beam patterning with sub-2nm line edge roughness. J. Vac. Sci. Technol. B: Microelectron. Nanometer Struct. 2005, 23(1):271-273.
15. Zhang H.R., Egerton R., Malac M. Local thickness measurement through scattering contrast and electron energy-loss spectroscopy. Micron 2012, 43(1):8-15.
16. Reimer L. Transmission Electron Microscopy 1997, Springer Verlag, Berlin. 4th ed.
17. Maisel L.I., Glang R. Handbook of Thin Film Technology 1970, McGraw-Hill book Company, New York.
18. Yamamoto T., Wada Y., Sakata T., Mori H., Goto M., Hibin S., Yanagida S. Microwave-assisted preparation of silver nanoparticles. Chem. Lett. 2004, 33(2):158-159.
19. Kamino T., Yaguchi T., Ohnishi T., Umemura K., Tomimats S. Site specific TEM preparation using an FIB/STEM system. Microsc. Microanal. 2000, 6:510-511.
20. Egerton R.F., Li P., Malac M. Radiation damage in the TEM and SEM. Micron 2004, 35:399-409.